Plasma Assisted chemical vapor deposition of metal doped TiO2 thin film at low temperature

SCHEME: INTER

CALL: 2017

DOMAIN: MS - Materials, Physics and Engineering

FIRST NAME: Patrick

LAST NAME: Choquet

INDUSTRY PARTNERSHIP / PPP: No

INDUSTRY / PPP PARTNER:

HOST INSTITUTION: LIST

KEYWORDS:

START: 2018-02-01

END: 2021-07-31

WEBSITE: https://www.list.lu/